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GMR Series Multistage Roots Dry Vacuum Pump

GMR series dry pumps can be used in clean processes and general demanding processes; High reliability and extremely low operating cost;

Mainly suitable for etching and ion implantation process chambers in the semiconductor industry;

Low energy consumption, corrosion resistance, and small footprint.

CategoryIndustrial Equipment & Components

 ● GMR series dry pumps can be used in clean processes and general demanding processes; High reliability and extremely low operating cost;

● Mainly suitable for etching and ion implantation process chambers in the semiconductor industry;

● Low energy consumption, corrosion resistance, and small footprint.

Application Challenges and Application Areas

Process Condensation Corrosion Recommended Products Remark
IMP source ●   GMR  
Strip/Ashing     GMR  
Oxide Etch ●   GMR  
Poly Etch   ● GMR  
Metal Etch ● ● GMR For 6-inch and 8-inch Fab
HDP   ● GMR  

Technical Specifications

Model Maximum Pumping Speed Ultimate Pressure Inlet Port Diameter Exhaust Port Diameter Supply Voltage Rated power Operating Power Cooling Water Nitrogen Weight Noise
(m3/h) (mbar) (ISO) (NW) (V) (kW) (kW) (L/min) (slm) (kg) dB(A)
GMR200 210 <1×10-2 63 25 208/380 1.9 0.7 1.9 20-40 140 <63
GMR600 630 <5×10-3 100 25 208/380 4.8 0.8 2 20-40 203 <63
GMR1200 1100 <5×10-3 100 25 208/380 4.8 1 2 20-40 203 <63
GMR1800 1800 <5×10-3 100 40 208/380 6.5 1.7 3.6 20-90 350 <63

Dimensions

Model Length(mm) Width(mm) Height(mm)
GMR200 695 290 434
GMR600 685 275 706
GMR1200 685 275 706
GMR1800 901 390 780

Pumping Speed Curve

GMR Series Multistage Roots Dry Vacuum Pump — manufacturer illustration

Price and availability are provided on request. Please contact the supplier to confirm the required configuration.

SupplierGrand Hitek (Beijing)
CategoryIndustrial Equipment & Components
PriceContact for price
SKUGHT-P8
ModelGMR200, GMR600, GMR1200, GMR1800
BrandGrand Hitek
Product TypeDry Vacuum Pump