GHR Series Multistage Roots Dry Vacuum Pump

The GHR series dry pump is developed for high-flow H2 applications. It is suitable for medium and harsh process applications, such as MOCVD, silicon epitaxy, silicon carbide epitaxy and HJT. It has the characteristics of strong pumping capacity and high reliability;

It is suitable for diversified markets and is widely used in semiconductor, LED and photovoltaic industries.

CategoryIndustrial Equipment & Components

● The GHR series dry pump is developed for high-flow H₂ applications. It is suitable for medium and harsh process applications, such as MOCVD, silicon epitaxy, silicon carbide epitaxy and HJT. It has the characteristics of strong pumping capacity and high reliability;
● It is suitable for diversified markets and is widely used in semiconductor, LED and photovoltaic industries.

Application Challenges and Application Areas

Process	High-flow H₂	Recommended Products
MOCVD	●	GHR
Si EPI	●	GHR
SiC EPI	●	GHR
HJT	●	GHR

Technical Specifications

Model	Maximum Pumping Speed	Ultimate Pressure	Inlet Port Diameter	Exhaust Port Diameter	Supply Voltage	Operating Power	Cooling Water	Nitrogen	Weight	Noise
Model	(m³/h)	(mbar)	(ISO)	(NW)	（V）	（kW）	(L/min)	（slm）	（kg）	dB(A)
GHR600	600	＜5×10^-3	50	40	380-480	4.5	8	0-60	390	＜75
GHR700	650	＜5×10^-3	50	40	380-480	3.2	8	0-60	410	＜75

Dimensions

Model	Length（mm）	Width（mm）	Height（mm）
GHR600	1016	400	806
GHR700	1000	400	806

Pumping Speed Curve

GHR Series Multistage Roots Dry Vacuum Pump — manufacturer illustration

Price and availability are provided on request. Please contact the supplier to confirm the required configuration.

Supplier	Grand Hitek (Beijing)
Category	Industrial Equipment & Components
Price	Contact for price
SKU	GHT-P35
Model	GHR600, GHR700
Brand	Grand Hitek
Product Type	Dry Vacuum Pump

GHR Series Multistage Roots Dry Vacuum Pump

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